1. Overview of Equipment and Application Fields

The intelligent sliding-girder CVD system at 1200°C is an advanced chemical vapor deposition (CVD) equipment integrating automation, high efficiency, and precise temperature control. Its core innovation lies in the introduction of an electric sliding-girder push-pull system, replacing the traditional manual sample feeding method. This system allows users to control the sample stage accurately and smoothly from outside the furnace via touchscreen or software, pushing it into the 1200°C high-temperature reaction zone or pulling it into the rapid cooling zone. This design not only significantly enhances experimental safety by avoiding high-temperature operation risks but also achieves "second-level" rapid sample loading/unloading and quenching cooling, which is crucial for controlling grain size and freezing high-temperature phase structures. It is widely used in laboratory research and small-scale prototyping of graphene, carbon nanotubes, two-dimensional semiconductor materials, optical films, and hard coatings.

2. Core Functional Highlights

· Intelligent Electric Slide Rail Push-pull System

o Automated feeding and discharging: The system employs high-precision servo motors to drive the slide rails, allowing users to preset push-pull speeds, dwell times, and target positions. It supports one-touch automatic sample delivery to the center of the constant-temperature zone or rapid withdrawal to the cooling position after reaction completion.

o High repeatability: The mechanical guide rail ensures consistent sample placement positions each time, eliminating human operational errors and significantly improving the reproducibility of experimental data.

o Safety and efficiency: Completely eliminates the risk of direct manual contact with high-temperature furnace ports, while significantly reducing non-reaction time and improving equipment utilization. Particularly suitable for processes requiring frequent sample changes or rapid quenching.

· The 1200℃ high-precision dual-zone temperature control system features dual independent PID intelligent temperature control modules. Its heating elements utilize high-quality silicon-carbon rods with a maximum operating temperature of 1200℃ and a temperature control accuracy of ±1℃. The dual-zone design creates a temperature gradient to separately control precursor evaporation and substrate reaction temperatures. Supporting over 30 complex programmed temperature curves, it meets various demanding process requirements.

· The system features rapid cooling and temperature control, with a standard forced-air cooling chamber integrated into the slide rail mechanism. Upon reaction completion, the slide rail automatically transfers samples from the 1200°C high-temperature zone to the air-cooled area, achieving sub-room temperature within minutes. This rapid quenching capability effectively prevents excessive grain growth and stabilizes metastable structures at elevated temperatures, which is crucial for producing high-quality single-layer graphene and nanocrystals.

· Precision Multi-Channel Gas Delivery and Control System. This integrated system features 4-6 high-purity gas channels, each equipped with an imported mass flow controller (MFC) with a wide flow control range and ±1% F.S. accuracy. It enables precise ratio matching and rapid switching of reaction gases, carrier gases, and doping gases. The unique bypass exhaust design ensures stable reaction chamber pressure during gas switching, guaranteeing uniform film growth.

· The wide-range vacuum and pressure adaptive system supports both atmospheric pressure chemical vapor deposition (APCVD) and low-pressure chemical vapor deposition (LPCVD) processes. It features a high-performance mechanical pump with a maximum vacuum of 5×10⁻³ Pa (molecular pump modules are optional). The built-in high-precision vacuum gauge provides real-time pressure monitoring, and the system can be integrated with electric valves for automatic pressure feedback control.

· Comprehensive Intelligent Security Protection

o Multi-layer protection: Features over-temperature alarm with power-off, cooling water flow monitoring (water cut-off for heating), overcurrent protection, leakage protection, and gas leak alarm.

o Anti-collision design: The slide rail system features built-in limit sensors and overload protection to prevent mechanical failures from damaging the equipment.

o Human-machine interaction: Featuring a large-size color touchscreen, it displays temperature curves, slide rail positions, gas flow rates, and vacuum levels intuitively, with support for storing and one-click retrieval of process parameters.

3. Technical Parameters and Specifications

4. Typical Application Scenarios

· High-quality graphene growth: Using rapid push-pull and quenching techniques, large-area, low-defect single-layer graphene is grown on copper foil, with effective control of nucleation density.

· Preparation of carbon nanotube arrays: Highly aligned carbon nanotubes were grown by precisely controlling the activation time and reaction time of the catalyst.

· Study of metastable materials: Preparation of novel nanomaterials that require rapid cooling after high-temperature synthesis to maintain specific crystal structures.

· High-throughput process screening: The automated loading and unloading function enables multiple experiments within a single day, accelerating the optimization process of process parameters.

· Multi-layer heterojunction growth: Through automatic push-pull and atmosphere switching, two-dimensional heterojunctions of different materials are sequentially grown on the same substrate.

· Teaching and Demonstration: Safe automated operations are ideal for university teaching demonstrations, reducing operational risks for students.

5. Why choose the intelligent sliding-girder CVD system?

The intelligent sliding-gear CVD system operating at 1200°C represents the next-generation advancement in automated chemical vapor deposition technology. Its innovative electric sliding-gear design effectively addresses three critical challenges in traditional CVD experiments: safety risks associated with manual operations, inconsistent results, and slow cooling speeds. This system delivers exceptional process control capabilities and high experimental efficiency, catering to both researchers pursuing top-tier crystal quality and development teams requiring frequent experiments. With its intuitive interface and comprehensive safety features, the system simplifies complex CVD processes, enabling you to stay ahead in nanomaterial research and develop more competitive scientific achievements.